Correlation between oxygen flow-controlled resistive switching and capacitance behavior in gallium oxide memristors grown via RF sputtering

射频溅射法生长的氧化镓忆阻器中氧气流控制电阻开关和电容行为之间的相关性

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Abstract

We studied on the bipolar resistive switching (RS)-dependent capacitance of Ga(2)O(3) memristors, grown using controlled oxygen flow via a radio frequency sputtering process. The Ag/Ga(2)O(3)/Pt memristor structure was employed to investigate the capacitance changes associated with RS behavior and oxygen concentration. In the low-resistance state (LRS), capacitance increased by over 60 times compared to the high-resistance state (HRS). Furthermore, in the HRS state, increasing the oxygen flow from 0 to 0.3 sccm resulted in an 80 % decrease in capacitance, while in the LRS state, capacitance increased by 128 %. These results indicate that RS-dependent capacitance in Ga(2)O(3) memristors is influenced by the density of oxygen vacancies. The presence of oxygen vacancies affects charge storage capacity and capacitance, with higher oxygen concentrations leading to reduced capacitance in HRS and increased capacitance in LRS. The results contribute to the understanding of the capacitance behavior in Ga(2)O(3) memristors and highlight the significance of oxygen vacancies in their operation.

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