Low-Frequency Noise-Based Mechanism Analysis of Endurance Degradation in Al/αTiO(x)/Al Resistive Random Access Memory Devices

基于低频噪声的Al/αTiO(x)/Al电阻式随机存取存储器器件耐久性退化的机理分析

阅读:1

Abstract

In this work, we analyze a resistive switching random access memory (RRAM) device with the metal-insulator-metal structure of Al/αTiO(x)/Al. The transport mechanism of our RRAM device is trap-controlled space-charge limited conduction, which does not change during the endurance test. As the number of resistive switching (RS) cycles increases, the current in the low-resistance state (LRS) does not change significantly. In contrast, degradation in the high-resistance state (HRS) is noticeably evident. According to the RS cycle, the current shift fits well with the stretched-exponential equation. The normalized noise power spectral density (S(i)/I(2)) measured in the HRS is an order of magnitude higher than that in the LRS owing to the difference in the degree of trap occupancy, which is responsible for the transition of resistance states. During the consecutive RS, the S(i)/I(2) in the HRS rapidly decreases for approximately 100 cycles and then saturates. In contrast, in the LRS, the S(i)/I(2) does not change significantly. Here we propose a model associated with the endurance degradation of the experimental device, and the model is verified with a 1/f noise measurement.

特别声明

1、本页面内容包含部分的内容是基于公开信息的合理引用;引用内容仅为补充信息,不代表本站立场。

2、若认为本页面引用内容涉及侵权,请及时与本站联系,我们将第一时间处理。

3、其他媒体/个人如需使用本页面原创内容,需注明“来源:[生知库]”并获得授权;使用引用内容的,需自行联系原作者获得许可。

4、投稿及合作请联系:info@biocloudy.com。