Human exposure to air contaminants under the far-UVC system operation in an office: effects of lamp position and ventilation condition

办公室远紫外线系统运行时空气污染物对人体的影响:灯管位置和通风条件的影响

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Abstract

The far-UVC (222 nm) system has emerged as a solution for controlling airborne transmission, yet its effect on indoor air quality, particularly concerning positioning, remains understudied. In this study, we examined the impact of far-UVC lamp position on the disinfection and secondary contaminant formation in a small office. We employed a three-dimensional computational fluid dynamics (CFD) model to integrate UV intensity fields formed by different lamp positions (ceiling-mounted, wall-mounted, and stand-alone types) along with the air quality model. Our findings reveal that the ceiling-mounted type reduces human exposure to airborne pathogens by up to 80% compared to scenarios without far-UVC. For all the lamp positions, O(3) concentration in the breathing zone increases by 4-6 ppb after one hour of operation. However, it should be noted that a high concentration zone (> 25 ppb) forms near the lamp when it is turned on. Moreover, ventilation plays a crucial role in determining human exposure to airborne pathogens and secondary contaminants. Increasing the ventilation rate from 0.7 h(-1) to 4 h(-1) reduces airborne pathogen and secondary contaminant concentrations by up to 90%. However, caution is warranted as higher ventilation rates can lead to elevated O(3) indoors, especially under conditions of high outdoor O(3) concentrations.

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