Interfacial Engineering at Quantum Dot-Sensitized TiO(2) Photoelectrodes for Ultrahigh Photocurrent Generation

量子点敏化TiO₂光电极的界面工程实现超高光电流产生

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Abstract

Metal oxide semiconductor/chalcogenide quantum dot (QD) heterostructured photoanodes show photocurrent densities >30 mA/cm(2) with ZnO, approaching the theoretical limits in photovoltaic (PV) cells. However, comparative performance has not been achieved with TiO(2). Here, we applied a TiO(2)(B) surface passivation layer (SPL) on TiO(2)/QD (PbS and CdS) and achieved a photocurrent density of 34.59 mA/cm(2) under AM 1.5G illumination for PV cells, the highest recorded to date. The SPL improves electron conductivity by increasing the density of surface states, facilitating multiple trapping/detrapping transport, and increasing the coordination number of TiO(2) nanoparticles. This, along with impeded electron recombination, led to enhanced collection efficiency, which is a major factor for performance. Furthermore, SPL-treated TiO(2)/QD photoanodes were successfully exploited in photoelectrochemical water splitting cells, showing an excellent photocurrent density of 14.43 mA/cm(2) at 0.82 V versus the Reversible Hydrogen Electrode (RHE). These results suggest a new promising strategy for the development of high-performance photoelectrochemical devices.

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