Displacement Talbot lithography for nano-engineering of III-nitride materials
用于III族氮化物材料纳米工程的位移式塔尔博特光刻技术
期刊:Microsystems & Nanoengineering
影响因子:9.9
doi:10.1038/s41378-019-0101-2
Coulon, Pierre-Marie; Damilano, Benjamin; Alloing, Blandine; Chausse, Pierre; Walde, Sebastian; Enslin, Johannes; Armstrong, Robert; Vézian, Stéphane; Hagedorn, Sylvia; Wernicke, Tim; Massies, Jean; Zúñiga-Pérez, Jesus; Weyers, Markus; Kneissl, Michael; Shields, Philip A