Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization
双(2-氨基-5-噻吩基)酮作为耐氧敏化剂用于常规自由基光聚合
期刊:Angewandte Chemie-International Edition
影响因子:16.9
doi:10.1002/anie.202518608
Poplata, Taner; Wang, Qunying; Allonas, Xavier; Jäger, Martin; Gutmann, Jochen S; Dmitrieva, Evgenia; Hartmann, Horst; Strehmel, Bernd