日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:

Disinfection of Respirators with Ultraviolet Radiation

利用紫外线对呼吸器进行消毒

Poster, Dianne L; Hardwick, Matthew; Miller, C Cameron; Riley, Michael A; Rodrigo, W W Shanaka I; Vladar, Andras E; Wright, John D; Zangmeister, Christopher D; Zarobila, Clarence; Starkweather, Jeremy; Wynne, John; Yilzarde, Jason

Nondestructive shape process monitoring of three-dimensional high aspect ratio targets using through-focus scanning optical microscopy

利用聚焦扫描光学显微镜对三维高纵横比目标进行无损形状过程监测

Attota, Ravi Kiran; Kang, Hyeonggon; Scott, Keana; Allen, Richard; Vladar, Andras E; Bunday, Benjamin

X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement

X射线光刻掩模计量:利用扫描电镜透射电子进行线宽测量

Postek, Michael T; Lowney, Jeremiah R; Vladar, Andras E; Keery, William J; Marx, Egon; Larrabee, Robert D

Interlaboratory Study on the Lithographically Produced Scanning Electron Microscope Magnification Standard Prototype

实验室间对光刻法制备的扫描电子显微镜放大倍率标准原型的研究

Postek, Michael T; Vladar, Andras E; Jones, Samuel N; Keery, William J