Low-defect-density WS2 by hydroxide vapor phase deposition
通过氢氧化物气相沉积制备低缺陷密度 WS2
期刊:Nature Communications
影响因子:14.7
doi:10.1038/s41467-022-31886-0
Yi Wan, En Li, Zhihao Yu, Jing-Kai Huang, Ming-Yang Li, Ang-Sheng Chou, Yi-Te Lee, Chien-Ju Lee, Hung-Chang Hsu, Qin Zhan, Areej Aljarb, Jui-Han Fu, Shao-Pin Chiu, Xinran Wang, Juhn-Jong Lin, Ya-Ping Chiu, Wen-Hao Chang, Han Wang, Yumeng Shi, Nian Lin, Yingchun Cheng, Vincent Tung, Lain-Jong Li7
