Nature of the metal-insulator transition in few-unit-cell-thick LaNiO(3) films
厚度仅为几个晶胞的LaNiO(3)薄膜中金属-绝缘体转变的性质
期刊:Nature Communications
影响因子:15.7
doi:10.1038/s41467-018-04546-5
Golalikhani, M; Lei, Q; Chandrasena, R U; Kasaei, L; Park, H; Bai, J; Orgiani, P; Ciston, J; Sterbinsky, G E; Arena, D A; Shafer, P; Arenholz, E; Davidson, B A; Millis, A J; Gray, A X; Xi, X X
