The Method of Low-Temperature ICP Etching of InP/InGaAsP Heterostructures in Cl(2)-Based Plasma for Integrated Optics Applications
用于集成光学应用的基于Cl₂等离子体的InP/InGaAsP异质结构的低温ICP刻蚀方法
期刊:Micromachines
影响因子:3
doi:10.3390/mi12121535
Ishutkin, Sergey; Arykov, Vadim; Yunusov, Igor; Stepanenko, Mikhail; Smirnov, Vyacheslav; Troyan, Pavel; Zhidik, Yury
