Area-Selective Atomic Layer Deposition of ZnO on Si\SiO(2) Modified with Tris(dimethylamino)methylsilane
在三(二甲氨基)甲基硅烷改性的Si/SiO(2)上进行ZnO的区域选择性原子层沉积
期刊:Materials
影响因子:3.2
doi:10.3390/ma16134688
Moeini, Behnam; Avval, Tahereh G; Brongersma, Hidde H; Průša, Stanislav; Bábík, Pavel; Vaníčková, Elena; Strohmeier, Brian R; Bell, David S; Eggett, Dennis; George, Steven M; Linford, Matthew R