Defect-interface coupling for stable lattice-oxygen-driven oxygen evolution at industrial current densities
缺陷界面耦合在工业电流密度下实现稳定的晶格氧驱动析氧反应
期刊:Nature Communications
影响因子:15.7
doi:10.1038/s41467-026-68730-8
Liu, Shujie; Sun, Mao; Dai, Letian; Wang, Shuhao; Yu, Zhaoshi; Li, Nan; Chen, Feilong; Wei, Yan; Shen, Yan; Zhao, Chuan; Wang, Mingkui