日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:

Using a Heavy Inert Diffusion Additive for Superconformal Atomic Layer Deposition

使用重惰性扩散添加剂进行超共形原子层沉积

Choolakkal, Arun Haridas; Mpofu, Pamburayi; Niiranen, Pentti; Birch, Jens; Pedersen, Henrik

Competitive co-diffusion as a route to enhanced step coverage in chemical vapor deposition

竞争性共扩散作为提高化学气相沉积中台阶覆盖率的一种途径

Choolakkal, Arun Haridas; Niiranen, Pentti; Dorri, Samira; Birch, Jens; Pedersen, Henrik