Vinyl Tris(trimethylsilyl)silanes: Substrates for Hiyama Coupling
乙烯基三(三甲基硅基)硅烷：Hiyama偶联反应的底物
期刊:Tetrahedron
影响因子:2.2
doi:10.1016/j.tet.2008.03.024
Wang, Zhizhong; Pitteloud, Jean-Philippe; Montes, Lucresia; Rapp, Magdalena; Derane, Djenny; Wnuk, Stanislaw F
