Detecting Important Features and Predicting Yield from Defects Detected by SEM in Semiconductor Production
利用扫描电镜在半导体生产中检测缺陷，从而检测重要特征并预测良率
期刊:Sensors
影响因子:3.5
doi:10.3390/s25134218
Amato, Umberto; Antoniadis, Anestis; De Feis, Italia; Doinychko, Anastasiia; Gijbels, Irène; La Magna, Antonino; Pagano, Daniele; Piccinini, Francesco; Selvan Suviseshamuthu, Easter; Severgnini, Carlo; Torres, Andres; Vasquez, Patrizia
