Extreme ultraviolet microscope characterization using photomask surface roughness
利用光掩模表面粗糙度进行极紫外显微镜表征
期刊:Scientific Reports
影响因子:3.9
doi:10.1038/s41598-020-68588-w
Gunjala, Gautam; Wojdyla, Antoine; Sherwin, Stuart; Shanker, Aamod; Benk, Markus P; Goldberg, Kenneth A; Naulleau, Patrick P; Waller, Laura
