日期 影响因子
日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:
–

Electrically Active Defects and Traps and Their Relation to Stoichiometry and Chemical Environment in HfO(2)/Al(2)O(3) Dielectric Stacks as Revealed by XPS

XPS揭示HfO₂/Al₂O₃介电叠层中电活性缺陷和陷阱及其与化学计量比和化学环境的关系

期刊:Materials
影响因子:3.2
doi:10.3390/ma18235420
Spassov, Dencho; Paskaleva, Albena; Avramova, Ivalina; Wozniak, Wojciech; Guziewicz, Elzbieta
发表日期：2025
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The Impact of Carbon on Electronic Structure of N-Doped ZnO Films: Scanning Photoelectron Microscopy Study and DFT Calculations

碳对氮掺杂氧化锌薄膜电子结构的影响：扫描光电子显微镜研究和DFT计算

期刊:Nanomaterials
影响因子:4.3
doi:10.3390/nano15010030
Guziewicz, Elzbieta; Mishra, Sushma; Amati, Matteo; Gregoratti, Luca; Volnianska, Oksana
发表日期：2024
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P-Type ZnO Films Made by Atomic Layer Deposition and Ion Implantation

采用原子层沉积和离子注入法制备p型ZnO薄膜

期刊:Nanomaterials
影响因子:4.3
doi:10.3390/nano14131069
Zhang, Guoxiu; Rebohle, Lars; Ganss, Fabian; Dawidowski, Wojciech; Guziewicz, Elzbieta; Koh, Jung-Hyuk; Helm, Manfred; Zhou, Shengqiang; Liu, Yufei; Prucnal, Slawomir
发表日期：2024
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Anisotropy of radiation-induced defects in Yb-implanted β-Ga(2)O(3)

Yb注入β-Ga(2)O(3)中辐射诱导缺陷的各向异性

期刊:Scientific Reports
影响因子:3.9
doi:10.1038/s41598-024-75187-6
Ratajczak, Renata; Sarwar, Mahwish; Kalita, Damian; Jozwik, Przemysław; Mieszczynski, Cyprian; Matulewicz, Joanna; Wilczopolska, Magdalena; Wozniak, Wojciech; Kentsch, Ulrich; Heller, René; Guziewicz, Elzbieta
发表日期：2024
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Effect of Strain and Surface Proximity on the Acceptor Grouping in ZnO

应变和表面邻近性对氧化锌中受体基团的影响

期刊:ACS Omega
影响因子:4.3
doi:10.1021/acsomega.3c06556
Volnianska, Oksana; Ivanov, Vitalii; Wachnicki, Lukasz; Guziewicz, Elzbieta
信号转导
发表日期：2023
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Enhanced Luminescence of Yb(3+) Ions Implanted to ZnO through the Selection of Optimal Implantation and Annealing Conditions

通过选择最佳的注入和退火条件，增强了注入到ZnO中的Yb(3+)离子的发光性能。

期刊:Materials
影响因子:3.2
doi:10.3390/ma16051756
Ratajczak, Renata; Guziewicz, Elzbieta; Prucnal, Slawomir; Mieszczynski, Cyprian; Jozwik, Przemysław; Barlak, Marek; Romaniuk, Svitlana; Gieraltowska, Sylwia; Wozniak, Wojciech; Heller, René; Kentsch, Ulrich; Facsko, Stefan
发表日期：2023
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Atomic Layer Deposition of HfO(2) Films Using TDMAH and Water or Ammonia Water

采用TDMAH和水或氨水进行HfO(2)薄膜的原子层沉积

期刊:Materials
影响因子:3.2
doi:10.3390/ma16114077
Gieraltowska, Sylwia; Wachnicki, Lukasz; Dluzewski, Piotr; Witkowski, Bartlomiej S; Godlewski, Marek; Guziewicz, Elzbieta
发表日期：2023
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Structural Properties of Thin ZnO Films Deposited by ALD under O-Rich and Zn-Rich Growth Conditions and Their Relationship with Electrical Parameters.

在富氧和富锌生长条件下通过原子层沉积法沉积的ZnO薄膜的结构特性及其与电学参数的关系

期刊:Materials
影响因子:3.2
doi:10.3390/ma14144048
Mishra Sushma, Przezdziecka Ewa, Wozniak Wojciech, Adhikari Abinash, Jakiela Rafal, Paszkowicz Wojciech, Sulich Adrian, Ozga Monika, Kopalko Krzysztof, Guziewicz Elzbieta
发表日期：2021
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