Low Hysteresis Vanadium Dioxide Integrated on Silicon Using Complementary Metal-Oxide Semiconductor Compatible Oxide Buffer Layer
采用互补金属氧化物半导体兼容氧化物缓冲层的低滞后硅基二氧化钒
期刊:Small Science
影响因子:8.3
doi:10.1002/smsc.202400398
Sahoo, Swayam Prakash; Bugnet, Matthieu; Infante, Ingrid Cañero; Pierron, Victor; Méchin, Laurence; Cervasio, Rebecca; Hemme, Pierre; Brubach, Jean-Blaise; Roy, Pascale; Fréchette, Luc G; Lamirand, Anne D; Vilquin, Bertrand