Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask
利用电子束光刻写入的相位掩模,通过近场全息技术制备软X射线变线间距光栅。
期刊:Journal of Synchrotron Radiation
影响因子:3
doi:10.1107/S1600577519008245
Lin, Dakui; Liu, Zhengkun; Dietrich, Kay; Sokolov, Andréy; Sertsu, Mewael Giday; Zhou, Hongjun; Huo, Tonglin; Kroker, Stefanie; Chen, Huoyao; Qiu, Keqiang; Xu, Xiangdong; Schäfers, Franz; Liu, Ying; Kley, Ernst Bernhard; Hong, Yilin