Study of Silicon Nitride Inner Spacer Formation in Process of Gate-all-around Nano-Transistors
栅极环绕式纳米晶体管工艺中氮化硅内间隔层形成的研究
期刊:Nanomaterials
影响因子:4.3
doi:10.3390/nano10040793
Li, Junjie; Li, Yongliang; Zhou, Na; Xiong, Wenjuan; Wang, Guilei; Zhang, Qingzhu; Du, Anyan; Gao, Jianfeng; Kong, Zhenzhen; Lin, Hongxiao; Xiang, Jinjuan; Li, Chen; Yin, Xiaogen; Wang, Xiaolei; Yang, Hong; Ma, Xueli; Han, Jianghao; Zhang, Jing; Hu, Tairan; Cao, Zhe; Yang, Tao; Li, Junfeng; Yin, Huaxiang; Zhu, Huilong; Luo, Jun; Wang, Wenwu; Radamson, Henry H
