Stable Organic Radical for Enhancing Metal-Monolayer-Semiconductor Junction Performance
用于增强金属-单层-半导体结性能的稳定有机自由基
期刊:ACS Applied Materials & Interfaces
影响因子:8.2
doi:10.1021/acsami.2c15690
De Sousa, J Alejandro; Pfattner, Raphael; Gutiérrez, Diego; Jutglar, Kilian; Bromley, Stefan T; Veciana, Jaume; Rovira, Concepció; Mas-Torrent, Marta; Fabre, Bruno; Crivillers, Núria