Heterogeneous integration of high-k complex-oxide gate dielectrics on wide band-gap high-electron-mobility transistors
高介电常数复合氧化物栅极介质在宽带隙高电子迁移率晶体管上的异质集成
期刊:Biomedical Engineering Online
影响因子:3.2
doi:10.1186/s12938-024-01241-z
Hassan, Eman A; Khalifa, Yassin; Morsy, Ahmed A; Yang, Mo-Chou; Wang, Peng; Wu, Yi; Feng, Guo-Ying; Inoue, Tomoki; Kubota, Koyo; Ikami, Tsubasa; Egami, Yasuhiro; Nagai, Hiroki; Kashikawa, Takahiro; Kimura, Koichi; Matsuda, Yu; Zhu, Yanmin; Li, Yuxing; Huang, Jianqing; Lam, Edmund Y; Metzdorf, Julius; Corhan, Patrick; Bach, David; Hirose, Sakyo; Lellinger, Dirk; Mönch, Stefan; Kühnemann, Frank; Schäfer-Welsen, Olaf; Bartholomé, Kilian; Ji, Jongho; Yang, Jeong Yong; Lee, Sangho; Kim, Seokgi; Yeom, Min Jae; Lee, Gyuhyung; Shin, Heechang; Bae, Sang-Hoon; Ahn, Jong-Hyun; Kim, Sungkyu; Kim, Jeehwan; Yoo, Geonwook; Kum, Hyun S
