Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
利用苯胺作为小分子抑制剂,对区域选择性原子层沉积过程中前驱体阻塞现象进行计算研究
期刊:Langmuir
影响因子:3.9
doi:10.1021/acs.langmuir.2c03214
Tezsevin, I; Maas, J F W; Merkx, M J M; Lengers, R; Kessels, W M M; Sandoval, T E; Mackus, A J M