Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection
采用软紫外纳米压印光刻技术设计用于 SERS 检测的高灵敏度基底
期刊:Nanoscale Research Letters
影响因子:5.5
doi:10.1186/1556-276X-9-623
Maximilien Cottat, Nathalie Lidgi-Guigui, Inga Tijunelyte, Grégory Barbillon, Frédéric Hamouda, Philippe Gogol, Abdelhanin Aassime, Jean-Michel Lourtioz, Bernard Bartenlian, Marc Lamy de la Chapelle