Structural Properties of Thin ZnO Films Deposited by ALD under O-Rich and Zn-Rich Growth Conditions and Their Relationship with Electrical Parameters.
在富氧和富锌生长条件下通过原子层沉积法沉积的ZnO薄膜的结构特性及其与电学参数的关系
期刊:Materials
影响因子:3.2
doi:10.3390/ma14144048
Mishra Sushma, Przezdziecka Ewa, Wozniak Wojciech, Adhikari Abinash, Jakiela Rafal, Paszkowicz Wojciech, Sulich Adrian, Ozga Monika, Kopalko Krzysztof, Guziewicz Elzbieta
