日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:

Continuous growth of hexagonal graphene and boron nitride in-plane heterostructures by atmospheric pressure chemical vapor deposition

常压化学气相沉积连续生长六方石墨烯和氮化硼平面异质结构

Gang Hee Han, Julio A Rodríguez-Manzo, Chan-Woo Lee, Nicholas J Kybert, Mitchell B Lerner, Zhengqing John Qi, Eric N Dattoli, Andrew M Rappe, Marija Drndic, A T Charlie Johnson