日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:

Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography

利用大面积卷对板纳米压印光刻技术制造具有超疏水和疏油特性的高纵横比微结构

Nithi Atthi, Marc Dielen, Witsaroot Sripumkhai, Pattaraluck Pattamang, Rattanawan Meananeatra, Pawasuth Saengdee, Oraphan Thongsook, Norabadee Ranron, Krynnaras Pankong, Warinrampai Uahchinkul, Jakrapong Supadech, Nipapan Klunngien, Wutthinan Jeamsaksiri, Pim Veldhuizen, Jan Matthijs Ter Meulen