Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films
采用化学气相沉积法生长连续单层反铁磁性CrOCl薄膜
期刊:Nature Communications
影响因子:15.7
doi:10.1038/s41467-025-66142-8
Chen, Chao; Liu, Yulu; Lu, Hongyan; Wang, Zihao; Zheng, Bowen; Guo, Qian; Xiao, Jingkuan; Wang, Ping; Xu, Wanting; Han, Yulin; Chen, Mingxuan; Cai, Xiaofan; Huang, Jiabei; Han, Yaqing; Zhang, Di; Du, Renjun; Mayorov, Alexander S; Li, Ziying; Zhang, Shuai; Huang, Yi; Cheng, Tingting; Chen, Zhaolong; Liu, Ronghua; Tang, Nujiang; Ni, Haibo; Wu, Di; Gao, Libo; Xi, Xiaoxiang; Wang, Qianghua; Wang, Lei; Novoselov, Kostya S; Yu, Geliang
