Surface sensitivity of atomic-resolution secondary electron imaging
原子分辨率二次电子成像的表面灵敏度
期刊:Microscopy
影响因子:1.9
doi:10.1093/jmicro/dfae041
Saitoh, Koh; Oyobe, Teppei; Igarashi, Keisuke; Sato, Takeshi; Matsumoto, Hiroaki; Inada, Hiromi; Endo, Takahiko; Miyata, Yasumitsu; Usami, Rei; Takenobu, Taishi
