Top-down patterning of topological surface and edge states using a focused ion beam
利用聚焦离子束自上而下地对拓扑表面和边缘态进行图案化
期刊:Nature Communications
影响因子:15.7
doi:10.1038/s41467-023-37102-x
Bake, Abdulhakim; Zhang, Qi; Ho, Cong Son; Causer, Grace L; Zhao, Weiyao; Yue, Zengji; Nguyen, Alexander; Akhgar, Golrokh; Karel, Julie; Mitchell, David; Pastuovic, Zeljko; Lewis, Roger; Cole, Jared H; Nancarrow, Mitchell; Valanoor, Nagarajan; Wang, Xiaolin; Cortie, David