日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:

Study of dosimetric properties of flattened and unflattened megavoltage x ray beam on high Z implant materials

研究平坦化和非平坦化兆伏级X射线束对高Z注入材料的剂量学特性

Rajamanickam, Tamilarasan; Muthu, Sivakumar; Murugan, Perumal; Pathokonda, Muddappa; Senthilnathan, Krishnamoorthy; Arunai Nambi Raj, Narayanasamy; Ramesh Babu, Padmanabhan