Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO(2)
基于酰胺络合物的HfO(2)原子层沉积中的双分子反应机理
期刊:Chemistry of Materials
影响因子:7
doi:10.1021/acs.chemmater.2c02947
D'Acunto, Giulio; Tsyshevsky, Roman; Shayesteh, Payam; Gallet, Jean-Jacques; Bournel, Fabrice; Rochet, François; Pinsard, Indiana; Timm, Rainer; Head, Ashley R; Kuklja, Maija; Schnadt, Joachim