Optimization of Structure and Electrical Characteristics for Four-Layer Vertically-Stacked Horizontal Gate-All-Around Si Nanosheets Devices
四层垂直堆叠水平环栅硅纳米片器件的结构和电学特性优化
期刊:Nanomaterials
影响因子:4.3
doi:10.3390/nano11030646
Zhang, Qingzhu; Gu, Jie; Xu, Renren; Cao, Lei; Li, Junjie; Wu, Zhenhua; Wang, Guilei; Yao, Jiaxin; Zhang, Zhaohao; Xiang, Jinjuan; He, Xiaobin; Kong, Zhenzhen; Yang, Hong; Tian, Jiajia; Xu, Gaobo; Mao, Shujuan; Radamson, Henry H; Yin, Huaxiang; Luo, Jun