Passivation Strategies for Far-Ultraviolet Al Mirrors Using Plasma-Based AlF(3) Processing
基于等离子体AlF(3)工艺的远紫外铝镜钝化策略
期刊:Chemistry of Materials
影响因子:7
doi:10.1021/acs.chemmater.5c01881
Sales, Maria Gabriela; Boris, David R; Rodriguez de Marcos, Luis V; Hart, James L; Lang, Andrew C; Albright, Benjamin S; Kessler, T Jude; Wollack, Edward J; Quijada, Manuel A; Walton, Scott G; Wheeler, Virginia D
