日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:

Compensation of the Stress Gradient in Physical Vapor Deposited Al(1-x)Sc(x)N Films for Microelectromechanical Systems with Low Out-of-Plane Bending

物理气相沉积Al(1-x)Sc(x)N薄膜应力梯度补偿及其在微机电系统中实现低面外弯曲

Beaucejour, Rossiny; D'Agati, Michael; Kalyan, Kritank; Olsson, Roy H 3rd