Oxygen Incorporation as a Route to Nondegenerate Zinc Nitride Semiconductor Thin Films
氧掺杂作为制备非简并氮化锌半导体薄膜的途径
期刊:ACS Applied Materials & Interfaces
影响因子:8.2
doi:10.1021/acsami.4c16921
Sirotti, Elise; Scaparra, Bianca; Böhm, Stefan; Pantle, Florian; Wagner, Laura I; Rauh, Felix; Munnik, Frans; Jiang, Chang-Ming; Kuhl, Matthias; Müller, Kai; Eichhorn, Johanna; Streibel, Verena; Sharp, Ian D