Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture
利用等离子体增强原子层沉积法生长GaN薄膜:含氨等离子体功率对残余氧捕获的影响
期刊:International Journal of Molecular Sciences
影响因子:4.9
doi:10.3390/ijms232416204
Jiang, Shicong; Wu, Wan-Yu; Ren, Fangbin; Hsu, Chia-Hsun; Zhang, Xiaoying; Gao, Peng; Wuu, Dong-Sing; Huang, Chien-Jung; Lien, Shui-Yang; Zhu, Wenzhang