UV-Laser Interference Lithography for Local Functionalization of Plasmonic Nanostructures with Responsive Hydrogel
紫外激光干涉光刻技术用于响应性水凝胶等离子体纳米结构的局部功能化
期刊:Journal of Physical Chemistry C
影响因子:
doi:10.1021/acs.jpcc.9b11059
Nestor Gisbert Quilis, Simone Hageneder, Stefan Fossati, Simone K Auer, Priyamvada Venugopalan, Anil Bozdogan, Christian Petri, Alberto Moreno-Cencerrado, Jose Luis Toca-Herrera, Ulrich Jonas, Jakub Dostalek
