Near-field sub-diffraction photolithography with an elastomeric photomask
采用弹性光掩模的近场亚衍射光刻技术
期刊:Nature Communications
影响因子:15.7
doi:10.1038/s41467-020-14439-1
Paik, Sangyoon; Kim, Gwangmook; Chang, Sehwan; Lee, Sooun; Jin, Dana; Jeong, Kwang-Yong; Lee, I Sak; Lee, Jekwan; Moon, Hongjae; Lee, Jaejun; Chang, Kiseok; Choi, Su Seok; Moon, Jeongmin; Jung, Soonshin; Kang, Shinill; Lee, Wooyoung; Choi, Heon-Jin; Choi, Hyunyong; Kim, Hyun Jae; Lee, Jae-Hyun; Cheon, Jinwoo; Kim, Miso; Myoung, Jaemin; Park, Hong-Gyu; Shim, Wooyoung
