Physical Vapor Deposition of High-Mobility P-Type Tellurium and Its Applications for Gate-Tunable van der Waals PN Photodiodes
高迁移率p型碲的物理气相沉积及其在栅极可调范德华PN光电二极管中的应用
期刊:ACS Applied Materials & Interfaces
影响因子:8.2
doi:10.1021/acsami.4c14865
Huang, Tianyi; Lin, Sen; Zou, Jingyi; Wang, Zexiao; Zhong, Yibai; Li, Jingwei; Wang, Ruixuan; Wang, Zhixing; St Luce, Kevin; Kim, Rex; Cui, Jianzhou; Wang, Han; Li, Qing; Xu, Min; Shen, Sheng; Zhang, Xu