日期:
2020 年 — 2026 年
2020
2021
2022
2023
2024
2025
2026
影响因子:

Chemomechanical modification of quantum emission in monolayer WSe2

单层 WSe2 量子发射的化学机械改性

M Iqbal Bakti Utama #, Hongfei Zeng #, Tumpa Sadhukhan #, Anushka Dasgupta #, S Carin Gavin, Riddhi Ananth, Dmitry Lebedev, Wei Wang, Jia-Shiang Chen, Kenji Watanabe, Takashi Taniguchi, Tobin J Marks, Xuedan Ma, Emily A Weiss, George C Schatz, Nathaniel P Stern, Mark C Hersam3

Foundry-compatible high-resolution patterning of vertically phase-separated semiconducting films for ultraflexible organic electronics

用于超柔性有机电子产品的垂直相分离半导体薄膜的铸造兼容高分辨率图案化

Binghao Wang, Wei Huang, Sunghoon Lee, Lizhen Huang, Zhi Wang, Yao Chen, Zhihua Chen, Liang-Wen Feng, Gang Wang, Tomoyuki Yokota, Takao Someya, Tobin J Marks, Antonio Facchetti2

In situ transport measurements reveal source of mobility enhancement of MoS2 and MoTe2 during dielectric deposition

原位传输测量揭示了电介质沉积过程中 MoS2 和 MoTe2 迁移率增强的来源

Ju Ying Shang, Michael J Moody, Jiazhen Chen, Sergiy Krylyuk, Albert V Davydov, Tobin J Marks, Lincoln J Lauhon