Reaction Mechanisms in Copper Atomic Layer Deposition Using Copper(II) Hexafluoroacetylacetonate and Diethylzinc via In Situ Time-of-Flight Mass Spectrometry
利用原位飞行时间质谱法研究六氟乙酰丙酮铜(II)和二乙基锌在铜原子层沉积中的反应机理
期刊:Chemistry of Materials
影响因子:7
doi:10.1021/acs.chemmater.5c01521
Minzoni, Camilla; Klejna, Sylwia; Mackosz, Krzysztof; Hain, Caroline; Figura-Jagoda, Aleksandra; Szkudlarek, Aleksandra; Sikora, Marcin; Werbrouck, Andreas; Ramisetty, Ramakrishna; Hoffmann, Patrik; Utke, Ivo