Bismuth Confinement: A Strategy for Low Resistance and Good Thermal Endurance of Integrated Contacts to MoS(2)
铋限制：一种实现与 MoS(2) 集成接触的低电阻和良好热耐久性的策略
期刊:ACS Nano
影响因子:16
doi:10.1021/acsnano.5c19217
Wu, Wen-Chia; Hung, Terry Y T; Hsueh, Fu-Kuo; Liu, Bo-Heng; Yun, Wei-Sheng; Chung, Yun-Yan; Wang, Yu-Ching; Lin, Ze-Rui; Li, Meng-Zhan; Jian, Zih-Siang; Hsu, Szu-Huan; Tsai, Jian-Chen; Chen, Jyun-Hong; Chen, Chien-Wei; Li, Yiming; Chang, Wen-Hao; Woon, Wei-Yen; Kei, Chi-Chung; Hou, Tuo-Hung; Cheng, Chao-Ching; Radu, Iuliana P; Chien, Chao-Hsin
