Thickness measurement of nm HfO(2) films
纳米级HfO₂薄膜的厚度测量
期刊:Metrologia
影响因子:2.4
doi:10.1088/0026-1394/58/1A/08016
Kim, K J; Kim, A; Kim, C S; Song, S W; Ruh, H; Unger, W E S; Radnik, J; Mata-Salazar, J; Juarez-Garcia, J M; Cortazar-Martinez, O; Herrera-Gomez, A; Hansen, P E; Madesen, J S; Senna, C A; Archanjo, B S; Damasceno, J C; Achete, C A; Wang, H; Wang, M; Windover, D; Steel, E; Kurokawa, A; Fujimoto, T; Azuma, Y; Terauchi, S; Zhang, L; Jordaan, W A; Spencer, S J; Shard, A G; Koenders, L; Krumrey, M; Busch, I; Jeynes, C
