Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
纤维素的光刻图案化:适用于高级应用的多功能双色调光刻胶
期刊:Cellulose
影响因子:
doi:10.1007/s10570-014-0471-4
Archim Wolfberger, Andreas Petritz, Alexander Fian, Jakob Herka, Volker Schmidt, Barbara Stadlober, Rupert Kargl, Stefan Spirk, Thomas Griesser