Wafer-scale high-κ HfO(2) dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS(2) transistors
用于二维 MoS2 晶体管的晶圆级高 κ HfO2 介电薄膜，其等效氧化层厚度小于 5 Å
期刊:Nature Communications
影响因子:15.7
doi:10.1038/s41467-026-68584-0
Zhang, Songge; Zhang, Tao; Yu, Hua; Li, Tong; Li, Xiuzhen; Cui, Chenyang; Zhou, Yuchao; Guo, Hailing; Wang, Shuopei; Zheng, Dongfeng; Huang, Liangfeng; Bai, Liqi; Liu, Su; Shen, Cheng; Yang, Wei; Du, Luojun; Shi, Dongxia; Xian, Lede; Tao, Xiaoming; Chai, Yang; Li, Na; Zhang, Guangyu
