Probing FeSi, a d-electron topological Kondo insulator candidate, with magnetic field, pressure, and microwaves
利用磁场、压力和微波探测FeSi（一种d电子拓扑近藤绝缘体候选材料）
期刊:Proceedings of the National Academy of Sciences of the United States of America
影响因子:9.1
doi:10.1073/pnas.2216367120
Breindel, Alexander J; Deng, Yuhang; Moir, Camilla M; Fang, Yuankan; Ran, Sheng; Lou, Hongbo; Li, Shubin; Zeng, Qiaoshi; Shu, Lei; Wolowiec, Christian T; Schuller, Ivan K; Rosa, Priscila F S; Fisk, Zachary; Singleton, John; Maple, M Brian
