Maskless photolithography based on digital light processing (DLP) is an attractive technique for the rapid, flexible, and cost-effective fabrication of complex structures with arbitrary surface profiles on the microscale. In this work, we introduce a new material system for structure formation by DLP that is based on photoreactive polymers for the local and light-induced C,H-insertion cross-linking (CHic). This approach allows a simple and versatile generation of microstructures with a broad spectrum of geometries and chemistries irrespective of the nature of the chosen substrates and thus allows direct writing of surface functionalization patterns with high spatial control. The CHicable prepolymer is first coated on a substrate to form a solvent-free (glassy) film, and then the DLP system patterns the light with arbitrary shape to induce local cross-linking of the prepolymer. Using this method, the desired structures with complex features with a lateral resolution of several microns and a topography of tens of nanometers could be fabricated within 30 s. Furthermore, the universal applicability of the CHic reaction enables the printing on a wide variety of substrates, which greatly broadens the using scenarios of this printing approach.
Substrate-Independent Maskless Writing of Functionalized Microstructures Using CHic Chemistry and Digital Light Processing.
利用 CHic 化学和数字光处理技术实现功能化微结构的无掩模基底独立写入
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作者:Song Dan, Kotz-Helmer Frederik, Rapp Bastian, Rühe Jürgen
| 期刊: | ACS Applied Materials & Interfaces | 影响因子: | 8.200 |
| 时间: | 2022 | 起止号: | 2022 Nov 9; 14(44):50288-50295 |
| doi: | 10.1021/acsami.2c12000 | 研究方向: | 其它 |
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