Abstract
Nanolithography techniques providing good scalability and feature size controllability are of great importance for the fabrication of integrated circuits (IC), MEMS/NEMS, optical devices, nanophotonics, etc. Herein, a cost-effective, easy access, and high-fidelity patterning strategy that combines the high-resolution capability of maskless plasmonic lithography with the spatial morphology controllability of grayscale lithography is proposed to generate the customized pattern profile from microscale to nanoscale. Notably, the scaling effect of gap size in plasmonic lithography with a contact bowtie-shaped nanoaperture (BNA) is found to be essential to the rapid decay characteristics of an evanescent field, which leads to a wide energy bandwidth of the required optimal dose to record pattern in per unit volume, and hence, achieves the volumetrically scalable control of the photon energy deposition in the space more precisely. Based on the proper calibration and cooperation of pattern width and depth, a grayscale-patterned map is designed to compensate for the dose difference caused by the loss of the high spatial frequency component of the evanescent field. A Lena nanostructure with varying feature sizes by spatially modulating the exposure dose distribution was successfully demonstrated, and besides, we also successfully generated a microlens array (MLA) with high uniformity. The practical patterning method makes plasmonic lithography significant in the fabrication of functional nanostructures with high performance, including metasurfaces, plasmonics, and optical imaging systems.