Abstract
Projection photolithography using an extreme-ultraviolet light source is the core technology that has enabled patterning on the scale of a few nanometers that is required for modern electronic chips. However, this high-end system is neither affordable nor needed for photonics where critical feature sizes are of 100s of nanometers (or of submicron). Although electron-beam lithography can provide a means for photonic device fabrication, it suffers from extremely low throughput. Therefore, a lithographic technique for submicron pattern generation at high throughput and low cost is in high demand. This group recently showed that maskless digital photolithography (MDPL), a convenient and versatile photolithographic technique that requires no photomask, could potentially address this demand by demonstrating photonic crystal (PhC) patterns with submicron periodicity and associated PhC band-edge lasers. In this paper, we report the fabrication of a PhC L3 cavity laser, which contains irregular air holes in terms of their positions and sizes, using the MDPL technique. Successful generation of such an aperiodic and nontrivial submicron pattern requires thorough understanding and scrupulous manipulation on light diffraction. Our achievements should provide the concrete foundation upon which compact, versatile, convenient, speedy, and economical lithographic tools for arbitrary submicron pattern generation can be developed.